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EUV

 

 

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1.     The coater and developer together are called

6.     A measure of the resolution that a certain optical system is   capable of

 

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2.     A coating that is placed on top or below the layer of resist to reduce the reflection of light, and hence, reduce the detrimental effects of standing waves or thin film interference.

3.     The process of subjecting a resist to light energy (or electron energy in the case of electron beam lithography) for the purpose of causing chemical change in the resist.

4.     The wavelength used to expose the photoresist in a lithographic system.

5.     A process in which a solid releases gas

7.     Extreme ultraviolet radiation

 

 

 

 

 

 

 

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